Modeling of a filamental discharge formation and development in ArF excimer laser

被引:0
|
作者
Akashi, H
Sakai, Y
Tagashira, H
Takahashi, N
Sasaki, T
机构
关键词
excimer laser; modeling; filamental discharge;
D O I
10.1117/12.273667
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Dynamics of a constricted filamental discharge in a discharge-excited ArF excimer laser has been examined using a two dimensional fluid model. An entire process of the filamental discharge, from its initiation and development to extinction, is shown. The filamental discharge is triggered at protrusions which would always exist on cathode surfaces, and develops in the direction of the anode assisted by the high field induced by space charge. The gas temperature in the filamental discharge in the vicinity of the cathode is found to rise. This temperature is shown to plays an important role in development of the filamental discharge. The effect of preionization electron density n(e0) is also examined, and significant development of the filamental discharge toward the anode is seen when the n(e0) becomes lower. The results are examined properly in connection with experimental observations.
引用
收藏
页码:172 / 182
页数:11
相关论文
共 50 条
  • [21] Microchannel formation in fused silica during ArF excimer laser irradiation
    Burkert, A.
    Triebel, W.
    Natura, U.
    Martin, R.
    PHYSICS AND CHEMISTRY OF GLASSES-EUROPEAN JOURNAL OF GLASS SCIENCE AND TECHNOLOGY PART B, 2007, 48 (03): : 107 - 112
  • [22] ARF EXCIMER LASER PROJECTION LITHOGRAPHY
    NAKAGAWA, H
    SASAGO, M
    TANI, Y
    ENDO, M
    KOGA, K
    HIRAI, Y
    NOMURA, N
    1989 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS, 1989, : 9 - 10
  • [23] SPECTRAL TUNING OF AN ARF EXCIMER LASER
    YE, C
    YUAN, CL
    SHANGGUAN, C
    DOU, AR
    CHINESE PHYSICS, 1982, 2 (01): : 230 - 231
  • [24] Performance improvement of a discharge-pumped ArF excimer laser by xenon gas addition
    Kataoka, N
    Itagaki, M
    Uchino, K
    Muraoka, K
    Takahashi, A
    Okada, T
    Maeda, M
    Hori, T
    Terashima, K
    Sumitani, A
    Enami, T
    Mizoguchi, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (12A): : 6735 - 6738
  • [25] Theoretical studies on energy loss processes in a discharge-pumped ArF excimer laser
    Furuhashi, H
    Yamada, J
    Uchida, Y
    SELECTED PAPER FROM INTERNATIONAL CONFERENCE ON OPTICS AND OPTOELECTRONICS '98: SILVER JUBILEE SYMPOSIUM OF THE OPTICAL SOCIETY OF INDIA, 1999, 3729 : 273 - 277
  • [26] Pellicle for ArF excimer laser photolithography
    Sakurai, I
    Shirasaki, T
    Kashida, M
    Kubota, Y
    PHOTOMASK AND X-RAY MASK TECHNOLOGY VI, 1999, 3748 : 177 - 187
  • [27] Measurement of temporal behavior of electron density in a discharge-pumped ArF excimer laser
    Nagai, S
    Furuhashi, H
    Kono, A
    Uchida, Y
    Goto, T
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1998, 34 (06) : 942 - 948
  • [28] TIME-RESOLVED ELECTRON-DENSITY MEASUREMENTS IN AN ARF EXCIMER LASER DISCHARGE
    MOCHIZUKI, T
    HIRATA, K
    NINOMIYA, H
    NAKAMURA, K
    MAEDA, K
    HORIGUCHI, S
    FUJIWARA, Y
    OPTICS COMMUNICATIONS, 1989, 72 (05) : 302 - 305
  • [29] Laser gain measurements at 193 nm in a small discharge cell containing ArF excimer laser gas mixtures
    A.V. Azarov
    P.J.M. Peters
    K.-J. Boller
    Applied Physics B, 2008, 90 : 455 - 460
  • [30] Modeling of multifilaments formation in dielectric barrier discharge excimer lamp
    Akashi, H
    Oda, A
    Sakai, Y
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2005, 33 (02) : 308 - 309