Electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface:: A first-principles investigation

被引:17
|
作者
Devynck, Fabien [1 ]
Sljivancanin, Z.
Pasquarello, Alfredo
机构
[1] Ecole Polytech Fed Lausanne, Inst Theoret Phys, CH-1015 Lausanne, Switzerland
[2] IRRMA, Inst Romand Rech Numer Phys Mat, CH-1015 Lausanne, Switzerland
关键词
D O I
10.1063/1.2769949
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using a density functional scheme, the authors investigate the electronic properties of an epitaxial silicon oxynitride layer on a 6H-SiC(0001) surface, as recently realized experimentally. Simulated scanning-tunneling-microscopy images of filled and empty states agree well with the experiment, lending support to the proposed atomic structure. In accord with the experiment, the local density of states indicates that the electronic band gap in the thin silicate layer at the surface is close to that of bulk SiO2. The authors show that this effect results from the surface of the epitaxial adlayer acting as a high-barrier potential for the SiC states induced in the oxide band gap.
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页数:3
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