δ-doping InGaP/GaAs heterojunction bipolar transistor

被引:1
|
作者
Chen, JY [1 ]
Cheng, SY [1 ]
Chang, WL [1 ]
Liu, WC [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
关键词
heterojunction bipolar transistor; delta-doped layer; potential spike; collector-emitter offset voltage; ideality factor;
D O I
10.1016/S0254-0584(97)02066-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An InGaP/GaAs heterojunction bipolar transistor with a 50 Angstrom undoped spacer and delta-doping sheet at base-emitter heterointerface is fabricated and studied, A common-emitter current gain of 280 and an offset voltage as small as 55 mV are obtained, respectively. These results shows that high current gain and low offset voltage can be attained simultaneously without the passivation of the emitter-base junction. The experimental results show that the potential spike is reduced by the employment of a delta-doped layer simultaneously. On the contrary, theoretical consideration also shows that the potential spike vanishes by inserting a delta-doping sheet between the emitter-base heterointerface. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:88 / 91
页数:4
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