High quality Hastelloy films deposited by XeCl pulsed laser ablation

被引:13
|
作者
Zocco, A
Perrone, A
Vignolo, MF
Duhalde, S
Avram, I
Morales, C
Pérez, T
机构
[1] Univ Lecce, INFM, Natl Nanotechnol Lab, Dept Phys, I-73100 Lecce, Italy
[2] Univ Lecce, INFM, Natl Nanotechnol Lab, NNL, I-73100 Lecce, Italy
[3] Univ Buenos Aires, Fac Ingn, RA-1063 Buenos Aires, DF, Argentina
关键词
pulsed laser deposition; Hastelloy films; corrosion tests; tribological coatings;
D O I
10.1016/S0169-4332(02)01423-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Pulsed laser ablation has been used to deposit Hastelloy thin films on carbon steel substrates at room temperature. Depositions have been carried out by XeCl excimer laser ablation (lambda = 308 nm, tau = 30 ns) of a bulk Hastelloy target in a high vacuum system (p = 10(-5) Pa). In order to obtain as thick and uniform films as possible, we took in account the maximum plume deflection angle we observed in our experiments. Optical studies of the plume revealed a deviation of about 15degrees towards the laser beam. To minimize the effects of the plume deflection, the substrate was placed along the deflected plume axis instead of the normal to the target surface. The plume deflection angle and the ablation rate of Hastelloy target as a function of number of laser pulses per site have been also measured. Scanning electron microscopy (SEM), energy dispersion X-ray (EDX) spectroscopy and X-ray diffraction (XRD) have been performed to analyse, respectively, the surface morphology, the chemical composition and the crystallographic structure of the deposited films. In order to correlate the microstructure of the film surface with its corrosion properties, potentiodynamic curves and linear polarisation resistance analyses have been carried out. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:669 / 675
页数:7
相关论文
共 50 条
  • [21] Al-Sn thin films deposited by pulsed laser ablation
    Perrone, A
    Zocco, A
    de Rosa, H
    Zimmermann, R
    Bersani, M
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2002, 22 (02): : 465 - 468
  • [22] Hardness of titanium carbide films deposited on silicon by pulsed laser ablation
    G. De Maria
    D. Ferro
    L. D'Alessio
    R. Teghil
    S. M. Barinov
    Journal of Materials Science, 2001, 36 : 929 - 935
  • [23] Investigations of ZnO thin films deposited by a reactive pulsed laser ablation
    J. B. Cui
    Y. C. Soo
    H. Kandel
    M. A. Thomas
    T. P. Chen
    C. P. Daghlian
    Science in China Series E: Technological Sciences, 2009, 52 : 99 - 103
  • [24] Photoluminescence study of ZnO thin films deposited by pulsed laser ablation
    Jang, YR
    Yoo, KH
    Park, SM
    COMPOUND SEMICONDUCTORS 2004, PROCEEDINGS, 2005, 184 : 389 - 392
  • [25] Structural characterisation of CNx thin films deposited by pulsed laser ablation
    Fuge, GM
    Rennick, CJ
    Pearce, SRJ
    May, PW
    Ashfold, MNR
    DIAMOND AND RELATED MATERIALS, 2003, 12 (3-7) : 1049 - 1054
  • [26] Thin films deposited by femtosecond pulsed laser ablation of tungsten carbide
    De Bonis, A.
    Teghil, R.
    Santagata, A.
    Galasso, A.
    Rau, J. V.
    APPLIED SURFACE SCIENCE, 2012, 258 (23) : 9198 - 9201
  • [27] Investigations of ZnO thin films deposited by a reactive pulsed laser ablation
    YCSOO
    HKANDEL
    MATHOMAS
    CPDAGHLIAN
    中国科学:技术科学, 2010, 40 (04) : 442 - 442
  • [28] Surface investigation of aluminium nitride films deposited by pulsed laser ablation
    Makris, TD
    Giorgi, R
    Delogu, P
    Teghil, R
    Marotta, V
    ECASIA 97: 7TH EUROPEAN CONFERENCE ON APPLICATIONS OF SURFACE AND INTERFACE ANALYSIS, 1997, : 1019 - 1022
  • [29] Thermal stability of amorphous carbon films deposited by pulsed laser ablation
    S. Rey
    F. Antoni
    B. Prevot
    E. Fogarassy
    J.C. Arnault
    J. Hommet
    F. Le Normand
    P. Boher
    Applied Physics A, 2000, 71 : 433 - 439
  • [30] Investigations of ZnO thin films deposited by a reactive pulsed laser ablation
    Y. C. SOO
    H. KANDEL
    M. A. THOMAS
    C. P. DAGHLIAN
    Science in China(Series E:Technological Sciences), 2009, 52 (01) : 99 - 103