Role of surface forces in the stability of evaporating thin liquid films that contain surfactant micelles

被引:6
|
作者
Gurkov, T
Danov, K
Alleborn, N
Raszillier, H
Durst, F
机构
[1] Univ Sofia, Fac Chem, Lab Thermodynam & Physicochem Hydrodynam, BU-1126 Sofia, Bulgaria
[2] Univ Erlangen Nurnberg, Lehrstuhl Stromungsmech, Tech Fak, D-91058 Erlangen, Germany
关键词
evaporating thin liquid films; linear stability analysis; oscillatory structural forces; surfactant at a high concentration; interfacial viscosity; Marangoni temperature and adsorption effects;
D O I
10.1006/jcis.1997.5312
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We consider an evaporating liquid him which lies on a planar heated solid substrate. The film contains a dissolved surfactant at a high concentration, so that micellar aggregates exist in the bulk. Linear stability analysis of this system is performed by investigating the time evolution of the amplitude of fluctuation waves. The liquid-vapor interface is regarded as a two-dimensional continuum characterized by intrinsic viscosity, specific adsorption, and surface tension. The latter quantities depend on the instantaneous subsurface concentration of surfactant monomers (subject to fluctuation) and upon the temperature. At small Reynolds and large Peclet numbers, and for thin films, the lubrication approximation model can be applied to solve the hydrodynamic problem. In the balance of normal stress at the fluid interface, we account for the contribution of intermolecular forces. There are van der Waals, electrostatic, steric, and oscillatory structural interactions, which are described in terms of separate components of disjoining pressure. The oscillatory structural forces are due to the presence of surfactant micelles or other colloidal particles in the film. These forces turn out to have the highest magnitude, and are of great importance for the stability. We solve numerically the evolution equation for the fluctuation, thus finding the critical thickness of film rupture and the critical lateral wave number. The influence of the surfactant type and concentration and the relative significance of the particular interactions under different conditions are discussed in detail. (C) 1998 Academic Press.
引用
收藏
页码:224 / 240
页数:17
相关论文
共 50 条
  • [41] Dynamic interferometric imaging of the thickness distribution of evaporating thin liquid films
    Stamm, Jacqueline
    Daume, Dominik
    Hartwig, Tobias
    Oschmann, Maximilian
    Schaefer, Julian
    Sauer, Hans Martin
    Doersam, Edgar
    JOURNAL OF COATINGS TECHNOLOGY AND RESEARCH, 2019, 16 (06) : 1663 - 1671
  • [42] Insoluble surfactant spreading along thin liquid films confined by chemical surface patterns
    Sinz, David K. N.
    Hanyak, Myroslava
    Zeegers, Jos C. H.
    Darhuber, Anton A.
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2011, 13 (20) : 9768 - 9777
  • [43] Nonlinear parametrically excited surface waves in surfactant-covered thin liquid films
    Matar, OK
    Kumar, S
    Craster, RV
    JOURNAL OF FLUID MECHANICS, 2004, 520 : 243 - 265
  • [44] Thin liquid films: Where hydrodynamics, capillarity, surface stresses and intermolecular forces meet
    Chatzigiannakis, Emmanouil
    Jaensson, Nick
    Vermant, Jan
    Current Opinion in Colloid and Interface Science, 2021, 53
  • [45] Thin liquid films: Where hydrodynamics, capillarity, surface stresses and intermolecular forces meet
    Chatzigiannakis, Emmanouil
    Jaensson, Nick
    Vermant, Jan
    CURRENT OPINION IN COLLOID & INTERFACE SCIENCE, 2021, 53
  • [46] Interaction forces in thin liquid films stabilized by hydrophobically modified inulin polymeric surfactant. 1. Foam films
    Exerowa, D
    Kolarov, T
    Pigov, I
    Levecke, B
    Tadros, T
    LANGMUIR, 2006, 22 (11) : 5013 - 5017
  • [47] Interaction forces in thin liquid films stabilized by hydrophobically modified inulin polymeric surfactant. 2. Emulsion films
    Exerowa, D.
    Gotchev, G.
    Kolarov, T.
    Khristov, Khr.
    Levecke, B.
    Tadros, Th.
    LANGMUIR, 2007, 23 (04) : 1711 - 1715
  • [48] STABILITY OF THIN LIQUID-FILMS
    NEVOLIN, VG
    ZHURNAL TEKHNICHESKOI FIZIKI, 1981, 51 (08): : 1758 - 1759
  • [49] Stability regimes of thin liquid films
    Majumdar, A
    Mezic, I
    MICROSCALE THERMOPHYSICAL ENGINEERING, 1998, 2 (03): : 203 - 213
  • [50] Dynamics and stability of thin liquid films
    Craster, R. V.
    Matar, O. K.
    REVIEWS OF MODERN PHYSICS, 2009, 81 (03) : 1131 - 1198