Water adlayers on aluminum oxide thin films

被引：6

作者：

Saiko, D. S. ^{[1
]}

Ganzha, V. V. ^{[1
]}

Titov, S. A. ^{[1
]}

Arsent'ev, I. N. ^{[2
]}

Kostyuchenko, A. V. ^{[3
]}

Soldatenko, S. A. ^{[3
]}

机构：

[1] Voronezh State Technol Acad, Voronezh 394000, Russia

[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia

[3] Voronezh State Tech Univ, Voronezh 394026, Russia

来源：

TECHNICAL PHYSICS | 2009年 / 54卷 / 12期

关键词：

Water Vapor Pressure; Metallic Electrode; Saturated Water Vapor; Scan Electron Microscopy Data; Quartz Resonator;

D O I：

10.1134/S1063784209120159

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of saturated water vapor on the performance of quartz cavities covered by magnetronsputtered oxide films is considered. A technique for precisely estimating the influence of small vapor concentrations on the frequency of the quartz cavities is described. Adsorption on the Al2O3 surface is characterized with a new model that allows one to list water layers on the surface and correlate the number of adlayers with experimental conditions. The estimated adsorption parameters agree well with available experimental data and results obtained by other authors.

引用

页码：1808 / 1813

页数：6

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