Ion sources for high and low energy extremes of ion implantation

被引：0

作者：

Hershcovitch, A. ^{[1
]}

Batalin, V. A. ^{[2
]}

Bugaev, A. S. ^{[3
]}

Gushenets, V. I. ^{[3
]}

Johnson, B. M. ^{[1
]}

Kolomiets, A. A. ^{[2
]}

Kropachev, G. N. ^{[2
]}

Kuibeda, R. P. ^{[2
]}

Kulevoy, T. V. ^{[2
]}

Litovko, I. V. ^{[3
]}

Masunov, E. S. ^{[4
]}

Oks, E. M. ^{[3
]}

Pershin, V. I. ^{[2
]}

Petrenko, S. V. ^{[2
]}

Polozov, S. M. ^{[4
]}

Poole, H. J. ^{[5
]}

Rudskoy, I. ^{[2
]}

Seleznev, D. N. ^{[2
]}

Storozhenko, P. A. ^{[6
]}

Svarovski, A. Ya. ^{[7
]}

Yushkov, G. Yu. ^{[3
]}

机构：

[1] Brookhaven Natl Lab, Upton, NY 11973 USA

[2] Inst Theoret & Expt Phys, Moscow, Russia

[3] Russian Acad Sci, Inst High Current Elect, Tomsk R-634055, Russia

[4] Moscow Engn Phys Inst, Moscow R-115409, Russia

[5] PVI, Oxnard, CA 93031 USA

[6] State Res Inst Chem & Technol Organoelement, Moscow R-111123, Russia

[7] AA Bochvara Scientif Res Inst Inorgan Mat, Russian Natl Res Ctr, Siberian Div, Seversk R-636070, Russia

来源：

ION IMPLANTATION TECHNOLOGY | 2006年 / 866卷

关键词：

ion sources for ion implantation;

D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A joint research and development effort focusing on the design of steady state, intense ion sources has been in progress for the past two and a half years. Our ultimate goal is to meet the two, energy extreme range needs of megaelectron-volt and 100's of electron-volt ion implanters. This endeavor has already resulted in record steady state output currents of higher charge state Antimony and Phosphorous ions: P2+ (8.6 pmA), P3+ (1.9 pnLA), and P4+ (0.12 pmA) and 4+ 16.2, 7.6, 3.3, and 2.2 pmA of Sb3+ Sb4+, Sb5+, and Sb6+ respectively. For low energy ion implantation our efforts involve molecular ions and a novel plasmaless/gasless deceleration method. To date, 1 emA of positive Decaborane ions were extracted at 10 keV and a somewhat smaller current of negative Decaborane ions were also extracted. Initial results also indicate that a Boron fraction of over 70% was extracted from a Bemas-Calutron ion source.

引用

页码：369 / +

页数：2

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