Deposition of Polytetrafluoroethylene Film Assisted by Synchrotron Radiation Irradiation

被引：2

作者：

Takeuchi, Masaya ^{[1
]}

Izumi, Hirokazu ^{[2
]}

Ishihara, Mari ^{[2
]}

Kobayashi, Toshiro ^{[3
]}

Yamaguchi, Akinobu ^{[1
]}

Utsumi, Yuichi ^{[1
]}

机构：

[1] Univ Hyogo, Lab & Adv Sci & Technol Ind, 3-1-2 Koto, Kobe, Hyogo 6781205, Japan

[2] Hyogo Prefectural Inst Technol, Suma Ku, 3-1-12 Yukihira, Kobe, Hyogo 6450037, Japan

[3] Tsuyama Coll, Natl Inst Technol, 624-1 Numa, Tsuyama, Okayama 7088509, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2019年 / 32卷 / 02期

关键词：

Synchrotron radiation; Polytetrafluoroethylene; Thin film; X-ray; Deposition; THIN-FILMS; FLUOROPOLYMER; FABRICATION; MEMBRANES;

D O I：

10.2494/photopolymer.32.249

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A novel process was developed for fabricating a polytetrafluoroethylene (PTFE) thin film using synchrotron radiation (SR). First, a PTFE substrate was exposed to high-energy X-rays (2-8 keV) at room temperature. Afterwards, the PTFE substrate (target) was heated under atmospheric pressure and fragments desorbed from the surface deposited on a glass substrate to produce a film with a thickness of above 10 mu m. The characterization of the chemical structure of the deposited film was carried out using X-ray diffraction (XRD). The results indicated that the crystalline structure of the film became closer to those of the PTFE substrate upon an increase in the X-ray irradiation of the sample. The fabrication process of this PTFE thin film could be applied to various fields because surface modification of the substrate can be easily carried out.

引用

页码：249 / 252

页数：4

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