Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma

被引:9
|
作者
Kenney, Jason A. [1 ]
Rauf, Shahid [1 ]
Collins, Ken [1 ]
机构
[1] Appl Mat Inc, Sunnyvale, CA 94085 USA
关键词
HIGH-FREQUENCY; 3-DIMENSIONAL SIMULATION; LOW-PRESSURE; DISCHARGES;
D O I
10.1063/1.3259420
中图分类号
O59 [应用物理学];
学科分类号
摘要
A three-dimensional fluid plasma model is used to investigate the impact of azimuthally asymmetric reactor components on spatial characteristics of parallel plate capacitively coupled plasmas. We consider three scenarios: high frequency (13.56 MHz) argon discharges with, separately, an off-axis circular plate surrounding the bottom electrode and an access port opening in the reactor sidewall, and a very high frequency (162 MHz) argon discharge with nonparallel electrodes. For the reactor with off-axis plate, both the Ar(+) density and flux are strongly perturbed toward the direction of maximum grounded surface area, with azimuthal variation in ion flux up to 10%. Perturbations in Ar(+) density due to the access port opening are localized to the region near the access port, and the impact on ion flux in the interelectrode region is minimal. Finally, the nonparallel electrodes result in a significant change in the location and shape of the Ar(+) density profile, going from a center-peaked discharge with parallel electrodes to a flattened off-center profile when tilted less than 1 degrees with a nominal 5 cm gap. (C) 2009 American Institute of Physics. [doi:10.1063/1.3259420]
引用
收藏
页数:6
相关论文
共 50 条
  • [42] The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma
    Zhang Zhihui
    Wu Xuemei
    Ning Zhaoyuan
    PLASMA SCIENCE & TECHNOLOGY, 2014, 16 (04) : 352 - 355
  • [43] The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma
    张志辉
    吴雪梅
    宁兆元
    Plasma Science and Technology, 2014, 16 (04) : 352 - 355
  • [44] The Effect of Inductively Coupled Discharge on Capacitively Coupled Nitrogen-Hydrogen Plasma
    张志辉
    吴雪梅
    宁兆元
    Plasma Science and Technology, 2014, (04) : 352 - 355
  • [45] PZT stack etch for MEMS devices in a capacitively coupled high density plasma reactor
    Werbaneth, P
    Almerico, J
    Jerde, L
    Marks, S
    DEVICE AND PROCESS TECHNOLOGIES FOR MEMS AND MICROELECTRONICS II, 2001, 4592 : 267 - 273
  • [46] MONTE-CARLO SIMULATION OF ELECTRON PROPERTIES IN RF PARALLEL PLATE CAPACITIVELY COUPLED DISCHARGES
    KUSHNER, MJ
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 4958 - 4965
  • [47] Dependence of Surface-Loss Probability of Hydrogen Atom on Pressures in Very High Frequency Parallel-Plate Capacitively Coupled Plasma
    Abe, Yusuke
    Kawashima, Sho
    Takeda, Keigo
    Sekine, Makoto
    Hori, Masaru
    APPLIED PHYSICS EXPRESS, 2010, 3 (10)
  • [48] Diamond synthesis in capacitively coupled 13.56 MHz radio frequency plasma using parallel plate electrodes with the addition of direct current power
    Asakura, Y
    Chattopadhyay, KK
    Matsumoto, S
    Hirakuri, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (06): : 3185 - 3189
  • [49] A technique for evaluating the RF voltage across the electrodes of a capacitively-coupled plasma reactor
    Lisovskiy, V.
    Booth, J. -P.
    Landry, K.
    Douai, D.
    Cassagne, V.
    Yegorenkov, V.
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2006, 36 (02): : 177 - 182
  • [50] Effects from easily ionized elements on silver analyte in atmospheric pressure parallel plate capacitively coupled plasma (PP-CCP)
    Rahman, MM
    Blades, MW
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2000, 55 (04) : 327 - 338