Effect of rough surface morphology on secondary electron emission from metal surface

被引：19

作者：

Zhang, Na ^{[1
,2
]}

Cao, Meng ^{[1
]}

Cui, Wan-Zhao ^{[2
]}

Hu, Tian-Cun ^{[1
,2
]}

机构：

[1] Xi An Jiao Tong Univ, Dept Elect Sci & Technol, Minist Educ, Key Lab Phys Elect & Devices, Xian 710049, Peoples R China

[2] China Acad Space Technol Xian, Natl Key Lab Sci & Technol Space Microwave, Xian 710100, Peoples R China

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2017年 / 56卷 / 07期

基金：

中国国家自然科学基金;

关键词：

YIELD; SUPPRESSION; SCATTERING; MODEL;

D O I：

10.7567/JJAP.56.075802

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Surface morphology is one of the main factor affecting the secondary electron (SE) emission from a rough metal surface. To overcome the limitation of only using the roughness to reveal the SE emission properties of a rough surface morphology, the fluctuation correlation length, which represents the spatial frequency of surface fluctuation, is thus introduced. In addition, the effects of the rough surface morphology on SE emission properties from the metal surface, which considers both the surface roughness and the fluctuation correlation length, are examined in this work. On the basis of the mechanism of electron interaction with morphology including the shading, multigeneration, and oblique effects, the SE emission properties versus the rough surface morphology, primary electron energy, and incident angle can be reasonably explained. The results further reveal the effect of surface morphology on SE emission, which gives a comprehensive insight into the control of SE emission properties using surface morphology. (C) 2017 The Japan Society of Applied Physics

引用

页数：5

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