Reliability of Copper Through-Package Vias in Bare Glass Interposers

被引:28
|
作者
Demir, Kaya [1 ]
Armutlulu, Andac [2 ]
Sundaram, Venky [1 ]
Raj, P. Markondeya [1 ]
Tummala, Rao R. [1 ]
机构
[1] Georgia Inst Technol, Packaging Res Ctr, Atlanta, GA 30332 USA
[2] Swiss Fed Inst Technol, CH-8092 Zurich, Switzerland
关键词
Failure mechanism analysis; finite-element modeling (FEM); glass interposer; reliability; through-package vias (TPVs); LOW-COST; SILICON; FABRICATION; PITCH;
D O I
10.1109/TCPMT.2017.2691407
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thermomechanical reliability of copper-plated through-package vias (TPVs) in ultrathin bare glass interposers was investigated through modeling, design, fabrication, reliability characterization, and failure analysis. Finite-element models were developed to analyze stress and strain distribution in TPV structures, and to obtain design guidelines for reliable TPVs. In order to experimentally validate the predictions of simulations, bare glass substrates of 100 mu m thickness with vias of 30 mu m diameter at 120 mu m pitch were metallized using Ti/Cu sputtering, followed by patterning and electroplating. Cu TPV daisy chains were fabricated and subjected to thermal cycling test between -55 degrees C and 125 degrees C to assess their thermomechanical reliability. Detailed cross-sectional analysis was also carried out by scanning electron microscope imaging of TPV cross sections. No electrical failures were detected in the Cu TPV chains. Failure analysis revealed copper delamination and crack formation in glass. The experimental reliability results are consistent with the thermomechanical models. Design and process recommendations are provided based on the modeling and experimental results.
引用
收藏
页码:829 / 837
页数:9
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