Transmission electron microscope calibration methods for critical dimension standards

被引:18
|
作者
Orji, Ndubuisi G. [1 ]
Dixson, Ronald G. [1 ]
Garcia-Gutierrez, Domingo I. [2 ]
Bunday, Benjamin D. [3 ]
Bishop, Michael [4 ]
Cresswell, Michael W. [1 ]
Allen, Richard A. [1 ]
Allgair, John A. [5 ]
机构
[1] NIST, 100 Bur Dr, Gaithersburg, MD 20899 USA
[2] UANL, FIME, Ave Univ S-N,Ciudad Univ, San Nicolas De Los Garza 66450, Nuevo Leon, Mexico
[3] SUNY Poly SEMATECH, 257 Fuller Rd,Suite 2200, Albany, NY 12203 USA
[4] 608 Oak Hollow Dr, Kerrville, TX 78028 USA
[5] AWG, 2028 East Ben White Blvd,240-2308, Austin, TX 78741 USA
来源
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2016年 / 15卷 / 04期
关键词
linewidth metrology; high-resolution transmission electron microscope; high angle annular dark field scanning transmission electron microscope; critical dimension atomic force microscope; uncertainty; SI traceability; CD; METROLOGY;
D O I
10.1117/1.JMM.15.4.044002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
One of the key challenges in critical dimension (CD) metrology is finding suitable dimensional calibration standards. The transmission electron microscope (TEM), which produces lattice-resolved images having scale traceability to the SI (International System of Units) definition of length through an atomic lattice constant, has gained wide usage in different areas of CD calibration. One such area is critical dimension atomic force microscope (CD-AFM) tip width calibration. To properly calibrate CD-AFM tip widths, errors in the calibration process must be quantified. Although the use of TEM for CD-AFM tip width calibration has been around for about a decade, there is still confusion on what should be considered in the uncertainty analysis. We characterized CD-AFM tip-width samples using high-resolution TEM and high angle annular dark field scanning TEM and two CD-AFMs that are implemented as reference measurement systems. The results are used to outline how to develop a rigorous uncertainty estimate for TEM/CD-AFM calibration, and to compare how information from the two electron microscopy modes are applied to practical CD-AFM measurements. The results also represent a separate validation of previous TEM/CD-AFM calibration. Excellent agreement was observed. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
收藏
页数:10
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