Current suppressed self-compliance characteristics of oxygen rich TiOy inserted Al2O3/TiOx based RRAM

被引:41
|
作者
Kim, Sungjoon [1 ,2 ]
Kim, Tae-Hyeon [1 ,2 ]
Kim, Hyungjin [3 ]
Park, Byung-Gook [1 ,2 ]
机构
[1] Seoul Natl Univ, Interuniv Semicond Res Ctr ISRC, Seoul 08826, South Korea
[2] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
[3] Inha Univ, Dept Elect Engn, Incheon 22212, South Korea
关键词
Titanium compounds - Alumina - RRAM - Aluminum oxide;
D O I
10.1063/5.0027757
中图分类号
O59 [应用物理学];
学科分类号
摘要
Although many studies have been continuously conducted to reduce the power consumption of a resistive random access memory (RRAM) cross-point array with the current-compliance effect, it has been difficult yet to realize intrinsic self-compliance effects in an RRAM device itself. In this study, a simple oxygen-rich TiOy layer is inserted into the Al2O3/TiOx-based RRAM stack as a current suppression layer, and XPS analysis is provided to compare the stoichiometry of the TiOx and TiOy layers. A self-compliance region is formed between the different breakdown voltages of Al2O3 and TiOy layers, and a relatively thinner current path is formed in the Al2O3 layer than a device without the TiOy layer and the overall current level is significantly decreased since the TiOy layer limits the overshoot current. Published under license by AIP Publishing.
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页数:6
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