Plasma assisted chemical vapour deposition of Cr coatings using chromium (III) acetylacetonate vapour source

被引：3
|
作者：
Premkumar, P. Amtony
Kuppusami, P.
Dasgupta, Arup
Mallika, C.
Nagaraja, K. S.
Raghunathan, V. S.
机构：
[1] Loyola Coll, Loyola Inst Frontier Energy, Dept Chem, Madras 34, Tamil Nadu, India
[2] Indira Gandhi Ctr Atom Res, Mat Characterisat Grp, Kalpakkam 603102, Tamil Nadu, India
[3] Indira Gandhi Ctr Atom Res, Reproc Res & Dev Div, Kalpakkam 603102, Tamil Nadu, India
来源：
MATERIALS LETTERS | 2007年 / 61卷 / 01期
关键词：
thin film; chemical vapour deposition; characterisation; hardness; microstructure; X-ray techniques;
D O I：
10.1016/j.matlet.2006.04.003
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We report here the synthesis and characterisation of Cr coatings by an environmental friendly Plasma Assisted Metal-Organic Chemical Vapour Deposition (PAMOCVD) process. The Cr coatings were developed using Cr(acaC)3 as the chemical vapour source at a substrate temperature and a power density of 550 degrees C and 70 mW/cm(2), respectively. The films were characterized using X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and Vicker's microhardness measurements. The investigations revealed that the Cr films are nanocrystalline, free from pores and cracks and have hardness of 1200 HV The energy dispersive analysis of X-rays and XPS confirmed the presence of Cr in the films. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：50 / 53
页数：4
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