Ferrite and high-temperature superconductor targets for sputtering

A method is described of preparing targets for sputtering, which involves the use of plasma deposition of respective powders onto a cooled metal plate. It is demonstrated that the use of plasma technology enables one to produce, in a controlled atmosphere, intricately shaped ceramic targets characterized by a highly uniform composition and by reliable mechanical and thermal contact of the resultant coating with the holder plate. Experiments are performed on the sputtering of targets to prepare polycrystalline ferrite films for magnetooptical applications and epitaxial films of high-temperature superconductors. (C) 2000 MAIK "Nauka/Interperiodica".