Chemical and structural characterization of thin films using electrons and photons

被引:0
|
作者
Hartmann, AJ [1 ]
Lamb, RN [1 ]
机构
[1] Univ New S Wales, Surface Sci & Technol Ctr, Sydney, NSW 2052, Australia
关键词
thin films; film structure; film chemistry; electronic structure; x-ray absorption; photoemission;
D O I
10.1002/(SICI)1096-9918(200001)29:1<3::AID-SIA697>3.0.CO;2-#
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This tutorial survey describes the application of selected photon- and electron-excited characterisation techniques for the analysis of thin films. The fundamentals of some techniques are discussed but the focus of this article is the link between the different techniques rather than a comprehensive discussion of them. Laboratory-based and synchrotron radiation techniques are compared for the characterization of long- and short-range structural order, as well as for chemical and electronic structural analysis. The practical application of the analytical procedures discussed is summarized in two case studies. Copyright (C) 2000 John Wiley & Sons, Ltd.
引用
收藏
页码:3 / 11
页数:9
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