USING ATOMIC LAYER DEPOSITION (ALD) IN NANO-ELECTRONIC DEVICES, SENSORS AND SYSTEMS

被引：0
|
作者：
Reader, Alec
机构：
[1] Nanotechnology Knowledge Transfer Network (NanoKTN), United States
来源：
ELECTRONICS WORLD | 2009年 / 115卷 / 1878期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：10 / +
页数：2
相关论文
共 50 条
  • [41] Diamond and carbon-derived vacuum micro- and nano-electronic devices
    Kang, WP
    Davidson, JL
    Wisitsora-at, A
    Wong, YM
    Takalkar, R
    Subramania, K
    Kerns, DV
    Hofmeister, WH
    DIAMOND AND RELATED MATERIALS, 2005, 14 (3-7) : 685 - 691
  • [42] Nested dissection solver for transport in 3D nano-electronic devices
    Y. Zhao
    U. Hetmaniuk
    S. R. Patil
    J. Qi
    M. P. Anantram
    Journal of Computational Electronics, 2016, 15 : 708 - 720
  • [43] Shot noise in nano-electronic systems under the perturbation of ac fields
    Zhao H.-K.
    Frontiers of Physics in China, 2007, 2 (1): : 55 - 62
  • [44] A Multi-Scale Framework for Nano-electronic Devices Modeling with Application to the Junctionless Transistor
    Peng, Jie
    Chen, Quan
    Wong, Ngai
    Meng, LingYi
    Yam, ChiYung
    Chen, GuanHua
    2013 IEEE INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC), 2013,
  • [45] Recent Advances Using Guanidinate Ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) Applications
    Kurek, Agnieszka
    Gordon, Peter G.
    Karle, Sarah
    Devi, Anjana
    Barry, Sean T.
    AUSTRALIAN JOURNAL OF CHEMISTRY, 2014, 67 (07) : 989 - 996
  • [46] Electrochemical Atomic Layer Deposition (E-ALD) of Pt Nanofilms Using SLRR Cycles
    Jayaraju, Nagarajan
    Vairavapandian, Deepa
    Kim, Youn Guen
    Banga, Dhego
    Stickney, John L.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2012, 159 (10) : D616 - D622
  • [47] The Study on Nano-Electromechanical Transistors Using Atomic Layer Deposition
    Zhao Lingya
    Wang Yingjian
    Ji, Zhigang
    ADVANCED TECHNOLOGY IN TEACHING - PROCEEDINGS OF THE 2009 3RD INTERNATIONAL CONFERENCE ON TEACHING AND COMPUTATIONAL SCIENCE (WTCS 2009), VOL 1: INTELLIGENT UBIQUITIOUS COMPUTING AND EDUCATION, 2012, 116 : 123 - +
  • [48] Atomic layer deposition (ALD) of tin(IV) oxide films using tetraethyl tin and ozone
    Gladfelter, Wayne L.
    Warner, Ellis J.
    Cramer, Christopher J.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 244
  • [49] Atomic layer deposition (ALD):: from precursors to thin film structures
    Leskelä, M
    Ritala, M
    THIN SOLID FILMS, 2002, 409 (01) : 138 - 146
  • [50] Mechanistic Details of Surface Reactions in Atomic Layer Deposition (ALD) Processes
    Menno Bouman
    Christopher Clark
    Hugo Tiznado
    Francisco Zaera
    复旦学报(自然科学版), 2007, (05) : 729 - 729
12345