Note: Thermally stable thin-film filters for high-power extreme-ultraviolet applications

被引:4
|
作者
Tarrio, C. [1 ]
Berg, R. F. [1 ]
Lucatorto, T. B. [1 ]
Lairson, B. [2 ]
Lopez, H. [2 ]
Ayers, T. [2 ]
机构
[1] Natl Inst Stand & Technol, Sensor Sci Div, Gaithersburg, MD 20899 USA
[2] Luxel Corp, Friday Harbor, WA 98250 USA
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2015年 / 86卷 / 11期
关键词
SILICON;
D O I
10.1063/1.4935468
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7Wcm(-2), Ni-mesh-backed Zr filters have a typical lifetime of 20 h, at which point they suffer from pinholes and a 50% loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters to be about 634 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 60 K. We have exposed a Si filter backed by such a mesh for more than 60 h with little loss of transmission and no leaks. (C) 2015 AIP Publishing LLC.
引用
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页数:3
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