Polarization-insensitive silicon immersion grating for telecom applications

被引:1
|
作者
Higuchi, Yuichi [1 ]
Ishii, Yuzo [2 ]
Hadama, Koichi [1 ]
Yamaguchi, Joji [1 ]
Yamamoto, Tsuyoshi [1 ]
机构
[1] NTT Corp, NTT Microsyst Integrat Labs, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 2430198, Japan
[2] NTT Elect, Atsugi, Kanagawa 2430198, Japan
关键词
immersion grating; polarization-dependent loss; high diffraction efficiency; high dispersion power; HIGH-EFFICIENCY; WAVELENGTH;
D O I
10.1117/12.2037137
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We describe an immersion grating (IG) with both low polarization-dependent loss (PDL) and high diffraction efficiency. Our immersion grating consists of a silicon (Si) prism and a Si grating coated with dielectric film. We analyze the effect of the refractive index of dielectric film and clarify the refractive index ratio between a Si grating and dielectric film. Selecting an adequate material for the dielectric film, we design the diffraction efficiency of TM polarization without changing that of TE polarization. The simulation results for the optimized IG show a PDL of 0.2 dB and diffraction efficiency of -0.4 dB. A prototype with high dispersion power provides a low PDL of 0.6 dB, while maintaining a high diffraction efficiency of -0.4 dB.
引用
收藏
页数:10
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