Effect of B doping on electrical and thermal properties of SiC bodies fabricated by spark plasma sintering

被引:10
|
作者
Taki, Yukina [1 ]
Kitiwan, Mettaya [1 ,2 ]
Katsui, Hirokazu [1 ]
Goto, Takashi [1 ,3 ]
机构
[1] Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan
[2] KMITL, Fac Sci, Dept Phys, Chalongkrung Rd, Bangkok 10520, Thailand
[3] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, 122 Luoshi Rd, Wuhan, Hubei, Peoples R China
关键词
silicon carbide; electrical conductivity; Seebeck coefficient; spark plasma sintering; SILICON-CARBIDE; BORON;
D O I
10.1016/j.matpr.2019.05.249
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
B-doped SiC bodies were fabricated by spark plasma sintering at 2373 K, 50 MPa, 300 s in a vacuum and N-2 atmosphere. The relative density of 1 mol% B doped-SiC body sintered in a vacuum and 5 mol% B doped-SiC body sintered in N-2 atmosphere were 97 and 98%, respectively. The electrical conductivity of B-doped SiC bodies sintered in a vacuum with 0.5 mol% B and that with 1 mol% B sintered in N-2 atmosphere showed semi-insulative conduction in the range of 3-5 x 10(-3) S m(-1) at room temperature. The thermal conductivity of B-doped SiC body at 0.5 at% B sintered in a vacuum were 185 W m(-1) K-1 while that at 1 at% B sintered in N-2 atmosphere were 177 W m(-1) K-1 at room temperature. (C) 2019 Elsevier Ltd. All rights reserved.
引用
收藏
页码:211 / 215
页数:5
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