Silicon Chemical Vapor Deposition on macro and submicron powders in a fluidized bed

被引：29

作者：

Cadoret, L. ^{[1
]}

Reuge, N. ^{[1
]}

Pannala, S. ^{[2
]}

Syamlal, M. ^{[3
]}

Rossignol, C. ^{[4
]}

Dexpert-Ghys, J. ^{[4
]}

Coufort, C. ^{[1
]}

Caussat, B. ^{[1
]}

机构：

[1] ENSIACET INPT, CNRS, Lab Genie Chim, UMR 5503, F-31106 Toulouse 1, France

[2] Oak Ridge Natl Lab, Computat Math Grp, Oak Ridge, TN 37831 USA

[3] Natl Energy Technol Lab, Morgantown, WV 26507 USA

[4] CNRS, CEMES, UPR 8011, F-31055 Toulouse 4, France

来源：

POWDER TECHNOLOGY | 2009年 / 190卷 / 1-2期

关键词：

Fluidized Bed; Chemical Vapor Deposition (CVD); Submicron powders; Silicon; Process modelling; RAMAN-SPECTRA; CFD MODELS; PARTICLES; PYROLYSIS; SILANE; FLOW;

D O I：

10.1016/j.powtec.2008.04.083

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Titanium oxide (TiO2) submicron powders have been treated by Chemical Vapor Deposition (CVD) in a vibro-fluidized bed in order to deposit silicon layers of nanometer scale on each individual grain from silane (SiH4), Experimental results show that for the conditions tested, the original granular structure of the powders is preserved for 90% of the initial bed weight while the remaining 10% consists of agglomerates in millimetre range found near the distributor of the reactor. A comparison between experimental and modelling results using the MFIX code shows that for Geldart's Group B alumina particles (Al2O3), the model represents both the bed hydrodynamics and silane conversion rates quite well. The future objective is to extend the simulation capability to cohesive submicron powders in order to achieve better predictability of the phenomena governing ultrafine particles. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：185 / 191

页数：7

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