Infrared reflective properties of AZO/Ag/AZO trilayers prepared by RF magnetron sputtering

被引:65
|
作者
Miao, Dagang [1 ]
Jiang, Shouxiang [1 ]
Shang, Songmin [1 ]
Chen, Zhuoming [1 ]
机构
[1] Hong Kong Polytech Univ, Inst Text & Clothing, Kowloon, Hong Kong, Peoples R China
关键词
AZO; Ag; Multilayer thin films; Infrared reflection; RF magnetron sputtering; ELECTRON-BEAM EVAPORATION; ZNO MULTILAYER COATINGS; THIN-FILMS; OXIDE-FILMS; TRANSPARENT; DEPOSITION; LAYER;
D O I
10.1016/j.ceramint.2014.04.139
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
AZO/Ag/AZO trilayer films were prepared on glass substrates by radio frequency (RF) magnetron sputtering technology. Crystal structure, surface morphology, visible transmittance, and color scale of the AZO/Ag/AZO coated trilayers as functions of Ag and AZO layers thickness were investigated by X-ray Diffraction (XRD), Scanning Electron Microscope (SEM), Atomic Force Microscopy (AFM), optical transmittance spectra and CIELAB system. In addition, the electrical and infrared reflection properties of the coated trilayers were examined by four-point probe system and Fourier Transform Infrared Spectroscopy. The results indicated that the Ag inner layer started forming a continuous film at the thickness of 10 am which was supported by XRD result of the distinct 200 and 220 Ag peaks. Besides, the highest average visible transmittance of 80.5% was obtained by the AZO (30 nm)/Ag (10 nm)/AZO (30 nm) structure. Furthermore, the lowest sheet resistivity of 4.36 Omega/sq and the highest infrared reflection rate of 96% in FIR region can be obtained by the AZO (30 nm)/Ag (13 nm)/AZO (30 nm) structure. The high infrared reflection property of the AZO/Ag/AZO trilayers makes it a promising candidate for energy conservation coatings. (C) 2014 Elsevier Ltd and Teclum Group S.r.l. All rights reserved.
引用
收藏
页码:12847 / 12853
页数:7
相关论文
共 50 条
  • [31] Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering
    Jeong, SH
    Boo, JH
    THIN SOLID FILMS, 2004, 447 : 105 - 110
  • [32] Processing Parameters and Property of AZO Thin Film Prepared by Magnetron Sputtering
    Kong, Hui
    Yang, Pingxiong
    Chu, Junhao
    3RD INTERNATIONAL PHOTONICS AND OPTOELECTRONICS MEETINGS (POEM 2010), 2011, 276
  • [33] The physical properties of AZO films deposited by RF magnetron sputtering in hydrogen-diluted argon
    Jwayeon Kim
    Jungsu Han
    Hyunjoon Jin
    Youhyuk Kim
    Kyeongsoon Park
    Journal of the Korean Physical Society, 2014, 65 : 346 - 350
  • [34] The physical properties of AZO films deposited by RF magnetron sputtering in hydrogen-diluted argon
    Kim, Jwayeon
    Han, Jungsu
    Jin, Hyunjoon
    Kim, Youhyuk
    Park, Kyeongsoon
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2014, 65 (03) : 346 - 350
  • [35] AZO films prepared by r.f. magnetron sputtering: structural, electrical and optical properties
    Grilli, Maria Luisa
    Sytchkova, Anna Krasilnikova
    Boycheva, Sylvia
    Piegari, Angela
    ADVANCES IN OPTICAL THIN FILMS III, 2008, 7101
  • [36] Structural, optical and electrical properties of AZO/Cu/AZO tri-layer films prepared by radio frequency magnetron sputtering and ion-beam sputtering
    Yang, Tianlin
    Zhang, Zhisheng
    Song, Shumei
    Li, Yanhui
    Lv, MaoShui
    Wu, Zhongchen
    Han, Shenghao
    VACUUM, 2008, 83 (02) : 257 - 260
  • [37] Comparison of RF and Pulsed Magnetron Sputtering for the Deposition of AZO Thin Films on PET
    Oliveira, L. P. G.
    Ramos, R.
    Rabelo, W. H.
    Rangel, E. C.
    Durrant, Steven F.
    Bortoleto, J. R. R.
    MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2020, 23 (03):
  • [38] Investigation of Nanostructure and Optical Properties of Flexible AZO Thin Films at Different Powers of RF Magnetron Sputtering
    Khatami, Sh
    Aval, L. Fekri
    Pour, G. Behzadi
    NANO, 2018, 13 (06)
  • [39] Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source
    Hossain, Md. Amzad
    Patwary, Md Abdul Majed
    Rahman, Md. Mustafizur
    Ohtsu, Yasunori
    AIP ADVANCES, 2022, 12 (01)
  • [40] Improvement of the uniformity in electronic properties of AZO films using an rf magnetron sputtering with a mesh grid electrode
    Yasui, Kanji
    Asano, Akira
    Otsuji, Miku
    Katagiri, Hironori
    Masuda, Atsushi
    Nishiyama, Hiroshi
    Inoue, Yasunobu
    Takata, Masasuke
    Akahane, Tadashi
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2008, 148 (1-3): : 26 - 29