In situ monitoring boosts yield of thin-film deposition processes

被引：0
|
作者：
Zöller, A
Boos, M
Hagedorn, H
Klug, W
Schmitt, C
机构：
[1] Leybold Optics GmbH, Alzenau, Germany
来源：
PHOTONICS SPECTRA | 2004年 / 38卷 / 07期
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
2
引用
收藏
页码：84 / +
页数：4
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