In radiolysis of water, three molecular products are formed (H2O2, O-2, and H-2). It has previously been shown that aqueous hydrogen peroxide is catalytically decomposed on many oxide surfaces and that the decomposition proceeds via the formation of surface-bound hydroxyl radicals. In this work, we have investigated the behavior of aqueous H-2 and O-2 in contact with ZrO2. Experiments were carried out in an autoclave with high H2 pressure and low O-2 pressure (40 and 0.2 bar, respectively). In the experiments the concentration of H-abstracting radicals was monitored as a function of time using tris(hydroxymethyl)aminomethane (Tris) as scavenger and the subsequent formation of formaldehyde to probe radical formation. The plausible formation of H2O2 was also monitored in the experiments. In addition, density functional theory (employing the hybrid PBE0 functional) was used to search for reaction pathways. The results from the,experiments show that hydrogen-abstracting radicals: are formed in the aqueous H2O2-system in contact with solid ZrO2. Formation of H2O2 is also detected, and the time dependent production of hydrogen-abstracting radicals follows the time-dependent H2O2 concentration, strongly:indicating that the radicals are produced upon catalytic decomposition of H2O2. The DFT study implies that H2O2 formation proceeds via a pathway where HO2 is a key intermediate. It is interesting to note that all the stable molecular products from aqueous radiolysis are precursors of quite intriguing radical reactions at water/oxide interfaces.
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Dalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
Yi, Yanhui
Wang, Li
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Dalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
Wang, Li
Yu, Juan
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Dalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
Yu, Juan
Guo, Hongchen
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Dalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
Guo, Hongchen
Zhang, Jialiang
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Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
Zhang, Jialiang
Meng, Changgong
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Dalian Univ Technol, Sch Chem, Dalian 116024, Liaoning, Peoples R ChinaDalian Univ Technol, Sch Chem Engn, State Key Lab Fine Chem, Dalian 116024, Liaoning, Peoples R China
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Chem & Mat Sci, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Chem & Mat Sci, Meguro Ku, Tokyo 1528552, Japan
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, Japan
Yamanaka, Ichiro
Tazawa, Satoshi
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, Japan
Tazawa, Satoshi
Murayama, Toru
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, Japan
Murayama, Toru
Ichihashi, Ryo
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, Japan
Ichihashi, Ryo
Hanaizumi, Noriko
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Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Grad Sch Sci & Engn, Dept Appl Chem, Meguro Ku, Tokyo 1528552, Japan