Effects of plasma power on the properties of low-k polymerlike organic thin films deposited by plasma-enhanced chemical vapor deposition using the toluene precursor

被引：21
|
作者：
Joo, J
Quan, YC
Jung, DG [1 ]
机构：
[1] Sungkyunkwan Univ, Dept Phys, Inst Basic Sci, Suwon 440746, South Korea
[2] Sungkyunkwan Univ, Dept Vacuum Sci & Engn, Suwon 440746, South Korea
来源：
JOURNAL OF MATERIALS RESEARCH | 2000年 / 15卷 / 01期
基金：
新加坡国家研究基金会;
关键词：
Polymerlike organic thin films;
D O I：
10.1557/JMR.2000.0037
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Effects of plasma power on the properties of polymerlike organic thin films deposited by plasma-enhanced chemical vapor deposition using the toluene precursor were studied. As the plasma power was increased from 5 to 60 W, the relative dielectric constant increased from 2.53 to 2.85. The film deposited at higher plasma power showed higher thermal stability. The film deposited at 60 W was stable up to 400 degrees C. All the films were insulating under applied field less than or equal to 1 MV/cm.
引用
收藏
页码：228 / 230
页数：3
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