Structural and optical properties of 3D growth multilayer InGaN/GaN quantum dots by metalorganic chemical vapor deposition

被引:3
|
作者
Han, XX [1 ]
Chen, Z [1 ]
Li, DB [1 ]
Wu, JJ [1 ]
Li, JM [1 ]
Sun, XH [1 ]
Liu, XL [1 ]
Han, PD [1 ]
Wang, XH [1 ]
Zhu, QS [1 ]
Wang, ZG [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
nanostructure; optical microscopy; metalorganic vapor phase epitaxy; nitrides;
D O I
10.1016/j.jcrysgro.2004.02.108
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Multilayer InGaN/GaN quantum dots (QDs) were grown on sapphire substrates through a three-dimensional growth mode, which was initiated by a special passivation processing introduced into the normal growth procedure. Surface morphology and photoluminescence properties of QDs with different stacking periods (from one to four) were investigated. The temperature dependences of the PL peak energies were found to show a great difference between two-layer and three-layer QDs. The fast redshift and the reversed sigmoidal temperature dependences of the PL energies for the former were attributed to the thermally activated carrier transfer from small to large dots. However, the increase of both the dot size and the spatial space among dots with the growing stacking periods reduced the carrier escape and retrapping. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:423 / 428
页数:6
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