Determination of the Optical Thickness of sub 10-nm Thin Metal Films by SPR Experiments

被引:15
|
作者
Rehman, Saif-ur [1 ,2 ]
Rahmouni, Anouar [1 ]
Mahfoud, Tarik [1 ]
Nesterenko, Dmitry V. [1 ]
Sekkat, Zouheir [1 ,2 ,3 ]
机构
[1] Moroccan Fdn Adv Sci Innovat & Res MAScIR, Opt & Photon Ctr, Rabat Design Ctr, Rabat 10100, Morocco
[2] Univ Mohammed V Agdal, Fac Sci, Rabat, Morocco
[3] Hassan II Acad Sci & Technol, Rabat, Morocco
关键词
Surface plasmons; Thin films; Optical constants; Ultra-thin metal clusters; SURFACE-PLASMON RESONANCE; SPECTROSCOPY; CONSTANTS; SENSOR; SINGLE; WAVES;
D O I
10.1007/s11468-013-9635-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We discuss the experimental data of surface plasmon resonance (SPR) occurring at the interface between air and single and bimetallic thin layers of Au and Ag prepared on glass substrates. The bilayer configuration allowed for the measurements of the optical constants of metallic films that are ultra thin; e.g., below 10 nm of thickness since SPR modes on such thin films in a single-layer configuration are shallow. We also discuss the effect of film thickness on SPR coupling. Thickness and refractive index of the films were determined by matching experimental SPR curves to the theoretical ones. Thickness and roughness of the films were also measured by atomic force microscopy. The results obtained by experimental measurements are in good agreement with AFM analysis.
引用
收藏
页码:381 / 387
页数:7
相关论文
共 50 条
  • [41] Comparison of ellipsometric methods for separate determination of thickness and optical constants of thin films
    Bortchagovsky, EG
    Getsko, OM
    LIGHTMETRY: METROLOGY, SPECTROSCOPY, AND TESTING TECHNIQUES USING LIGHT, 2001, 4517 : 126 - 133
  • [42] Temperature coefficient of resistance and thermal expansion coefficient of 10-nm thick gold films
    Oliva, A. I.
    Lugo, J. M.
    Gurubel-Gonzalez, R. A.
    Centeno, R. J.
    Corona, J. E.
    Aviles, F.
    THIN SOLID FILMS, 2017, 623 : 84 - 89
  • [43] Ultra-low-power and stable 10-nm FinFET 10T sub-threshold SRAM
    Abbasian, Erfan
    Birla, Shilpi
    Gholipour, Morteza
    MICROELECTRONICS JOURNAL, 2022, 123
  • [44] THICKNESS DETERMINATION OF THIN FILMS BY THE EVAPORATION METHOD
    STEVERDING, B
    ARS JOURNAL, 1962, 32 (02): : 294 - 296
  • [45] A facility for measuring the thickness of thin metal films
    Tolipov, Kh. B.
    RUSSIAN JOURNAL OF NONDESTRUCTIVE TESTING, 2016, 52 (10) : 554 - 556
  • [46] A facility for measuring the thickness of thin metal films
    Kh. B. Tolipov
    Russian Journal of Nondestructive Testing, 2016, 52 : 554 - 556
  • [47] THICKNESS CHECKING FOR THIN METAL FILMS.
    Konev, V.A.
    Lyubetskii, N.V.
    Tseitlin, Ya.M.
    1600, (27):
  • [48] Critical thickness for the agglomeration of thin metal films
    Boragno, C.
    de Mongeot, F. Buatier
    Felici, R.
    Robinson, I. K.
    PHYSICAL REVIEW B, 2009, 79 (15):
  • [49] THICKNESS CHECKING FOR THIN METAL-FILMS
    KONEV, VA
    LYUBETSKII, NV
    TSEITLIN, YM
    MEASUREMENT TECHNIQUES USSR, 1984, 27 (10): : 893 - 895
  • [50] USE OF COMPLEXOMETRY FOR DETERMINATION OF THICKNESS OF VACUUM-DEPOSITED THIN METAL-FILMS
    MASSE, G
    DUNOYER, JM
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1971, 26 (154): : 174 - &