Metallurgical graphene under different gas atmospheres and UV radiation for gas-sensing applications

被引:9
|
作者
Gaj, Justyna [1 ]
Clapa, Marian [1 ,3 ]
Nowak, Dorota [2 ]
Juszczak, Jaroslaw [1 ]
Galazka, Maciej [3 ]
Pelka, Marcin [3 ]
Niedzielski, Piotr [1 ]
机构
[1] Lodz Univ Technol, Inst Mat Sci & Engn, 1-15 Stefanowskiego St, PL-90924 Lodz, Poland
[2] Tricomed SA, 5-9 Swietojanska St, PL-90924 Lodz, Poland
[3] Adv Graphene Prod Sp Zoo, 4A Wysockiego St, PL-66002 Zielona Gora, Poland
关键词
Graphene; Annealing; Gas sensing; Ultraviolet light; Resistance; DEFECTS; TEMPERATURE; MOLECULES; HUMIDITY; SINGLE;
D O I
10.1016/j.sna.2020.112152
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Due to two-dimensional lattice and unique electrical properties graphene is a material of interest in gas sensing applications. In contrast to theoretical structure, real-life graphene contains numerous defects that modify its properties. The aim of the following study was to compare the influence of five different gaseous atmospheres and UV radiation on the electrical resistance of metallurgical graphene (HSMG (R)). Samples of virgin graphene and graphene annealed after transfer were used. Among the tested gases, hydrogen atmosphere showed the biggest impact on graphene resistance. The annealing step meant to cleanse graphene from process residues resulted in decreased graphene susceptibility to UV radiation. (c) 2020 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
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页数:8
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