Slit-Mura Detection through Non-contact Optical Measurements of In-Line Spectrometer for TFT-LCDs

被引:4
|
作者
Tzu, Fu-Ming [1 ]
Chou, Jung-Hua [1 ]
机构
[1] Natl Cheng Kung Univ, Tainan 70101, Taiwan
来源
IEICE TRANSACTIONS ON ELECTRONICS | 2009年 / E92C卷 / 03期
关键词
TFT-LCD; slit Mura; spectrometer; thickness; chromaticity; DEFECT INSPECTION;
D O I
10.1587/transele.E92.C.364
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Slit-Mura defect is a notorious yield flaw of color filters. In this study an Innovative non-contact in-line optical inspection method is developed to detect low contrast Slit Mura through quantitative measurements by a spectrometer. Using, the features of either thickness or chromaticity profiles across a slit Mura, a thickness difference from 21 nm to 41 nm of color filters can be differentiated accurately. Thus, the quality of color filters can be accessed in-line during the manufacturing process TFT-LCDs.
引用
收藏
页码:364 / 369
页数:6
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