Sweep potential deposition of Tm-Ni-Co alloy films in dimethylsulfoxide

被引:0
|
作者
Yuan, DS [1 ]
Liu, YL
Zhang, JX
Liu, GK
Tong, YX
机构
[1] Jinan Univ, Dept Chem, Guangzhou 510632, Peoples R China
[2] Zhongshan Univ, Sch Chem & Chem Engn, Guangzhou 510275, Peoples R China
关键词
physical chemistry; alloy film; sweep potential deposition; thulium;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The Tm-Ni-Co alloy films have been prepared by the sweep potential deposition technique. The surface appearance of Tm-Ni-Co alloy films was silver, smooth and adhesive. The surfaces of Tm-Ni-Co alloy films observed by scanning electron microscope (SEM) were uniform, adhesive and compact. The sizes of metallic grains were about 80-100 nm, 100-200 run, 50-60 nm, and 90-120 nm at 1 mV(.)s(-1), 5 mV(.)s(-1), 10 mV(.)s(-1) and 50 mV(.)s(-1), respectively. The Tm-Ni-Co alloy film was amorphous as proven by the X-ray diffraction (XRD).
引用
收藏
页码:189 / 192
页数:4
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