Dual-Stage Nanopositioning for High-Speed Scanning Probe Microscopy

被引：64

作者：

Tuma, Tomas ^{[1
,2
]}

Haeberle, Walter ^{[1
]}

Rothuizen, Hugo ^{[1
]}

Lygeros, John ^{[2
]}

Pantazi, Angeliki ^{[1
]}

Sebastian, Abu ^{[1
]}

机构：

[1] IBM Res Zurich, CH-8803 Ruschlikon, Switzerland

[2] Swiss Fed Inst Technol, Automat Control Lab, CH-8092 Zurich, Switzerland

来源：

IEEE-ASME TRANSACTIONS ON MECHATRONICS | 2014年 / 19卷 / 03期

关键词：

Atomic force microscopy (AFM); control design; mechatronics; nanopositioning; ATOMIC-FORCE MICROSCOPY; DESIGN; IDENTIFICATION; TRACKING; DENSITY; TUBE;

D O I：

10.1109/TMECH.2013.2266481

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

This paper presents a dual-stage approach to nanopositioning in which the tradeoff between the scanner speed and range is addressed by combining a slow, large-range scanner with a short-range scanner optimized for high-speed, high-resolution positioning. We present the design, finite-element simulations, and experimental characterization of a fast custom-built short-range scanner. The short-range scanner is based on electromagnetic actuation to provide high linearity, has a clean, high-bandwidth dynamical response and is equipped with a low-noise magnetoresistance-based sensor. By using advanced noise-resilient feedback controllers, the dual-stage system allows large-range positioning with subnanometer closed-loop resolution over a wide bandwidth. Experimental results are presented in which the dual-stage scanner system is used for imaging in a custom-built atomic force microscope.

引用

页码：1035 / 1045

页数：11

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