Effect of Polymer Microstructure on the Nucleation Behavior of Alumina via Atomic Layer Deposition

Atomic layer deposition is a technique that is able to integrate nanoscale inorganic coatings to organic polymers. Through this process a number of different inorganic coating morphologies are able to form during ALD nucleation on a wide variety of polymers. In this work, we provide a systematic analysis of the ALD nucleation characteristics on polymers that have subtle variations in microstructure, such as, the addition of pendant groups or change in length of the polymer repeat unit. Specifically, in situ quartz crystal microgravimetry is employed to understand the nucleation behavior of alumina ALD in a series of poly n-methacrylate and polyester thin films. The work indicates the effect that a subtle change in polymer microstructure has on the properties of the polymer film. The data indicates that the glass transition temperature of the polymer, as influenced by variations in microstructure, has a significant impact on the absorption/desorption characteristics during TMA/water exposures. Through this systematic approach, we demonstrate that ALD process parameters must be adjusted accordingly to promote the formation of desirable inorganic material interfaces.