An alternative approach for direct APC using scatterometry data

被引：0

作者：

Brill, B ^{[1
]}

Cohen, Y ^{[1
]}

Turovets, I ^{[1
]}

Elyasy, D ^{[1
]}

Beatus, T ^{[1
]}

机构：

[1] Nova Measuring Instruments Ltd, IL-76110 Rehovot, Israel

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVI, PTS 1 & 2 | 2002年 / 4689卷

关键词：

APC; process control; scatterometry; lithography; neural network;

D O I：

10.1117/12.473521

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Scatterometry is a promising method, capable of providing accurate profile information for a large range of applications. However, applying scatterometry to the production environment and applying it to APC is still difficult. In this paper we propose an alternative approach in which we apply a Neural Network to directly correlate scatterometry raw data and the lithography process control parameters. The proposed method is much easier to use than normal scatterometry, and can therefore be applied to APC much faster.

引用

页码：765 / 768

页数：4

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