Electron impact multiple ionization of neon, argon and xenon atoms close, to threshold:: appearance energies and Wannier exponents

被引:35
|
作者
Gstir, B
Denifl, S
Hanel, G
Rümmele, M
Fiegele, T
Cicman, P
Stano, M
Matejcik, S
Scheier, P
Becker, K
Stamatovic, A
Märk, TD
机构
[1] Leopold Franzens Univ, Inst Ionenphys, A-6020 Innsbruck, Austria
[2] Comenius Univ, Dept Plasma Phys, SK-84248 Bratislava, Slovakia
[3] Stevens Inst Technol, Dept Phys, Hoboken, NJ 07030 USA
[4] Fac Phys, YU-11001 Belgrade, Yugoslavia
关键词
D O I
10.1088/0953-4075/35/13/312
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report the results of the experimental determination of the appearance energy values AE(Xn+/X) for the formation of multiply charged Ne, Ar and Xe ions up to n = 4 (Ne), n = 6 (Ar) and n = 8 (Xe) following electron impact on Ne, Ar and Xe atoms using a dedicated high-resolution electron impact ionization mass spectrometer. The data analysis uses the Marquart-Levenberg algorithm, which is an iterative, nonlinear least-squares-fitting routine, in conjunction with either a two-function or a three-function fit based on a power threshold law. This allows us to extract the relevant AEs and corresponding exponents for a Wannier-type power law from the measured near-threshold data. The values of the AEs determined in this work are compared with other available experimental and spectroscopic values of the AEs,and the extracted-exponents are compared with other available experimental data and with the predictions of the various Wannier-type power law models.
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页码:2993 / 3007
页数:15
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