Low Pressure Chemical Vapor Deposition as a Tool for Deposition of Thin Film Battery Materials

被引：2
|
作者：
Oudenhoven, J. F. M. [1 ]
van Dongen, T. [2 ]
Niessen, R. A. H. [2 ]
de Croon, M. H. J. M. [1 ]
Notten, P. H. L. [1 ,2 ]
机构：
[1] Eindhoven Univ Technol, POB 513, NL-5600 MB Eindhoven, Netherlands
[2] Philips Res, NL-5656 AE Eindhoven, Netherlands
来源：
EUROCVD 17 / CVD 17 | 2009年 / 25卷 / 08期
关键词：
D O I：
10.1149/1.3207652
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Low Pressure Chemical Vapor Deposition was utilized for the deposition of LiCoO2 cathode materials for all-solid-state thin-film micro-batteries. To obtain insight in the deposition process, the most important process parameters were optimized for the deposition of crystalline electrode films on planar substrates. Also the electrochemical activity of the obtained LiCoO2 films was demonstrated.
引用
收藏
页码：653 / 658
页数：6
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