Low Pressure Chemical Vapor Deposition as a Tool for Deposition of Thin Film Battery Materials

被引：2
|
作者：
Oudenhoven, J. F. M. [1 ]
van Dongen, T. [2 ]
Niessen, R. A. H. [2 ]
de Croon, M. H. J. M. [1 ]
Notten, P. H. L. [1 ,2 ]
机构：
[1] Eindhoven Univ Technol, POB 513, NL-5600 MB Eindhoven, Netherlands
[2] Philips Res, NL-5656 AE Eindhoven, Netherlands
来源：
EUROCVD 17 / CVD 17 | 2009年 / 25卷 / 08期
关键词：
D O I：
10.1149/1.3207652
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Low Pressure Chemical Vapor Deposition was utilized for the deposition of LiCoO2 cathode materials for all-solid-state thin-film micro-batteries. To obtain insight in the deposition process, the most important process parameters were optimized for the deposition of crystalline electrode films on planar substrates. Also the electrochemical activity of the obtained LiCoO2 films was demonstrated.
引用
收藏
页码：653 / 658
页数：6
相关论文
共 50 条
  • [1] Germanium thin film formation by low-pressure chemical vapor deposition
    Meng, ZG
    Jin, ZH
    Gururaj, BA
    Chu, P
    Kwok, HS
    Wong, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (04) : 1423 - 1429
  • [2] Low pressure chemical vapor deposition of PbO thin film from lead dichloride
    Dai, GR
    Xu, JY
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1998, 17 (12) : 969 - 971
  • [3] Barium titanate thin film growth by low-pressure metalorganic chemical vapor deposition
    Sekine, T.
    Okumura, Y.
    Satou, A.
    Akiyama, Y.
    EUROCVD 17 / CVD 17, 2009, 25 (08): : 327 - 332
  • [4] Cobalt oxide thin film low pressure metal-organic chemical vapor deposition
    Schmid, Stefan
    Hausbrand, Rene
    Jaegermann, Wolfram
    THIN SOLID FILMS, 2014, 567 : 8 - 13
  • [5] Preparation of Strontium Titanate Film by Low Pressure Chemical Vapor Deposition
    Kon, D.
    Hashiba, K.
    Kawashima, T.
    Akiyama, Y.
    EUROCVD 17 / CVD 17, 2009, 25 (08): : 333 - 338
  • [6] THIN-FILM BATTERY COMPONENTS DEPOSITED BY CONVEYORIZED ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION
    PLANO, L
    CROUCHBAKER, S
    HUGGINS, RA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C297 - C297
  • [7] Growth of Cu thin films by low pressure chemical vapor deposition
    School of Physics, University of Hyderabad, Hyderabad-500 046, India
    不详
    J Mater Sci Mater Electron, 1 (51-57):
  • [8] The growth of Cu thin films by low pressure chemical vapor deposition
    Kodigala Subba Ramaiah
    R. D. Pilkington
    A. E. Hill
    R. D. Tomlinson
    Journal of Materials Science: Materials in Electronics, 1999, 10 : 51 - 57
  • [9] Low pressure chemical vapor deposition of nanograin polysilicon thin films
    Peng, Ying-Cai
    Ma, Lei
    Kang, Jian-Bo
    Fan, Zhi-Dong
    Jian, Hong-Bin
    Rengong Jingti Xuebao/Journal of Synthetic Crystals, 2006, 35 (03): : 560 - 564
  • [10] The growth of Cu thin films by low pressure chemical vapor deposition
    Ramaiah, KS
    Pilkington, RD
    Hill, AE
    Tomlinson, RD
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1999, 10 (01) : 51 - 57
12345