Alternatives for Rear-Surface Passivation in III-V on Si Multi-junction Solar Cells

被引:0
|
作者
Martin, Diego [1 ,2 ]
Garcia-Tabares, Elisa [3 ]
Rey-Stolle, Ignacio [3 ]
机构
[1] Univ Rey Juan Carlos, Area Tecnol Elect, Madrid, Spain
[2] Yale Univ, Dept Elect Engn, New Haven, CT USA
[3] Univ Politecn Madrid, Inst Energia Solar, Madrid, Spain
关键词
III-V on Si; multi-junction solar cell; rear-surface passivation; SILICON; EFFICIENCY;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
In the recent developments in the field of III-V on Si dual-junction solar cells, low attention has been paid to optimizing the device configuration to maximize its photovoltaic performance. The few practical implementations reported heretofore have been based on III-V solar cell processing techniques. Although the fabrication of conventional Si structures is a well-known technology, certain steps have been found to be incompatible with III-V semiconductors, primarily due to their high thermal load. Accordingly, in this work we discuss the applicability of different alternatives for the Si rear-surface passivation (Al-BSF, PERC- and HIT-like schemes) in III-V/Si dual-junction solar cell structures. Using numerical simulations, a comparison of the Si bottom cell performance in a GaAsP/Si dual-junction solar cell structure is presented for the mentioned alternatives.
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页数:4
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