193-nm excimer-laser-induced densification of fused silica

被引：58
|
作者：
Allan, DC
Smith, C
Borrelli, NF
Seward, TP
机构：
[1] Glass and Glass-Ceramics Research, Corning Incorporated, Corning
来源：
OPTICS LETTERS | 1996年 / 21卷 / 24期
关键词：
D O I：
10.1364/OL.21.001960
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report the densification of fused silica as a function of exposure to pulsed 193-nm excimer-laser irradiation. Defining a dose as the number of pulses N times the square of fluence I per pulse, we find that densification follows a universal function of dose, a x (NI2)(b), where a and b can vary somewhat according to glass preparation. Densification is measured with interferometry and birefringence, interpreted with a finite-element elastic model. Wave-front distortion for a typical photolithographic lens element in typical use conditions is described. (C) 1996 Optical Society of America
引用
收藏
页码：1960 / 1962
页数：3
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