X-Ray Calc: A software for the simulation of X-ray reflectivity

被引：13

作者：

Penkov, Oleksiy, V ^{[1
]}

Kopylets, Igor A. ^{[2
]}

Khadem, Mahdi ^{[3
]}

Qin, Tianzuo ^{[1
]}

机构：

[1] Zhejiang Univ, ZJU UIUC Inst, Int Campus, Haining 314400, Peoples R China

[2] Natl Tech Univ KhPI, UA-61002 Kharkiv, Ukraine

[3] Yonsei Univ, Dept Mech Engn, Seoul 03722, South Korea

来源：

SOFTWAREX | 2020年 / 12卷

关键词：

X-ray reflectivity; Grazing incidence X-ray reflectometry; Coatings; Simulation; Fitting; MULTILAYER MIRRORS; SCATTERING; COATINGS; FILMS;

D O I：

10.1016/j.softx.2020.100528

中图分类号：

TP31 [计算机软件];

学科分类号：

081202 ; 0835 ;

摘要：

X-Ray Calc is a fast and convenient tool for the simulation of X-ray reflectivity (XRR). The software was developed with the aim of simplification and acceleration of the XRR simulation through a user-friendly interface and optimized computation core. X-Ray Calc implements the recursive approach of calculation of XRR based on Fresnel equations and proposes special instruments for the modeling of periodical multilayer structures. X-Ray Calc computes XRR as a function of wavelength or grazing angle and can be used for the simulation of the performance of X-ray mirrors. Computer modeling and fitting to experimental grazing incidence X-ray reflectometry (GIXR) is a powerful tool. It could be used for a comprehensive analysis of the structure of single- and multi-component layered nanomaterials. This method allows for the obtaining of information about thickness, roughness, and density of individual layers in coatings by the fitting of the modeled GIXR to the experimental ones. (C) 2020 The Authors. Published by Elsevier B.V.

引用

页数：5

共 50 条

[31] MULTILAYER ROUGHNESS EVALUATED BY X-RAY REFLECTIVITY
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