Growth characteristics and device properties of MOD derived β-Ga2O3 films

被引:22
|
作者
Guo, Pei [1 ]
Xiong, Jie [1 ]
Zhao, Xiaohui [1 ]
Sheng, Tuo [1 ]
Yue, Chao [1 ]
Tao, Bowan [1 ]
Liu, Xingzhao [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
关键词
THIN-FILMS; ULTRAVIOLET PHOTODETECTORS; MICROSTRUCTURE; NANOWIRES;
D O I
10.1007/s10854-014-2066-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
beta-Ga2O3 films prepared by metal organic deposition (MOD) on (000l) sapphire substrates, have been developed for ultraviolet photodectors. The structural, surface, optical properties of MOD derived beta-Ga2O3 films depending on growth temperatures were investigated. As growth temperature increased, the crystallinity of beta-Ga2O3 films enhanced, crystallite size and surface roughness increased. The optical band gap of beta-Ga2O3 films maintained within 4.8-4.9 eV at different growth temperatures. Metal-semiconductor-metal ultraviolet photodetectors based on MOD derived beta-Ga2O3 films were successfully fabricated, demonstrating the responsivity of 0.76 A/W at 20 V and the upper limits of the rise and decay time of 50 and 30 ms, respectively, indicating a promising low-cost approach for Ga2O3-base photoelectronics applications.
引用
收藏
页码:3629 / 3632
页数:4
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