Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

被引：2

作者：

Wang Hongyu ^{[1
]}

Jiang Wei ^{[2
]}

Sun Peng ^{[1
]}

Zhao Shuangyun ^{[1
]}

Li Yuang ^{[1
]}

机构：

[1] Anshan Normal Univ, Sch Phys Sci & Technol, Anshan 114005, Peoples R China

[2] Huazhong Univ Sci & Technol, Sch Phys, Wuhan 430074, Peoples R China

来源：

PLASMA SCIENCE & TECHNOLOGY | 2016年 / 18卷 / 02期

基金：

中国国家自然科学基金;

关键词：

CCP; dual frequency coupling; PIC/MC; HOLLOW-CATHODE; STANDING-WAVE; LARGE-AREA; ELECTRON;

D O I：

10.1088/1009-0630/18/2/08

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two radio frequency (RF) sources. Particle-in-cell/Monte Carlo (PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects. Some variation and potential application of the discharging configuration is discussed briefly.

引用

页码：143 / 146

页数：4

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