Ti ion density in inductively coupled plasma enhanced dc magnetron sputtering

被引：13

作者：

Nakamura, T ^{[1
]}

Okimura, K ^{[1
]}

机构：

[1] Tokai Univ, Dept Elect, Kanagawa 2591292, Japan

来源：

VACUUM | 2004年 / 74卷 / 3-4期

关键词：

Ti ion; inductively coupled plasma; ionization fraction of Ti; optical absorption; Langmuir probe;

D O I：

10.1016/j.vacuum.2004.01.005

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ion density of sputtered titanium (Ti) in inductively coupled plasma (ICP) enhanced de magnetron sputtering was measured using an optical absorption method at Ar pressure of 3.5 Pa for target bias voltages of -600, -400 and -200 V. The radio frequency coil power for the ICP ranged from 40 to 240 W. Ti ionization fractions were calculated from the Ti ion and Ti atom densities measured at roughly the middle position of the coil. Plasma parameters of the ICP were, also, measured by a single Langmuir probe. (C) 2004 Elsevier Ltd. All rights reserved.

引用

页码：391 / 395

页数：5

共 50 条

[41] -3000V dc bias Ti oxidation by inductively coupled plasma
Valencia-Alvarado, R.
de la Piedad-Beneitez, A.
de la Rosa-Vazquez, J.
Lopez-Callejas, R.
Barocio, S. R.
Mercado-Cabrera, A.
Pena-Eguiluz, R.
Munoz-Castro, A. E.
PHYSICA SCRIPTA, 2008, T131
[42] Effect of Enhanced Plasma Density on the Properties of Aluminium Doped Zinc Oxide Thin Films Produced by DC Magnetron Sputtering
Jun Gong
Journal of Materials Science & Technology, 2011, 27 (05) : 393 - 397
[43] Effect of Enhanced Plasma Density on the Properties of Aluminium Doped Zinc Oxide Thin Films Produced by DC Magnetron Sputtering
Gong, Jun
Zhang, Xiaobo
Pei, Zhiliang
Sun, Chao
Wen, Lishi
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2011, 27 (05) : 393 - 397
[44] Structure and properties of Ti films deposited by dc magnetron sputtering, pulsed dc magnetron sputtering and cathodic arc evaporation
Yang, Chao
Jiang, Bailing
Liu, Zheng
Hao, Juan
Feng, Lin
SURFACE & COATINGS TECHNOLOGY, 2016, 304 : 51 - 56
[45] Effects of magnetic flux density and substrate temperature on Ni films prepared by means of unbalanced magnetron sputtering assisted by inductively coupled plasma
Otani, K.
Sakata, N.
Ozaki, T.
Kawabata, K.
15TH INTERNATIONAL CONFERENCE ON THIN FILMS (ICTF-15), 2013, 417
[46] Micro variable infrared filter using magnetron sputtering system enhanced with an inductively coupled RF plasma for CO2 measurement
Hara, H.
Kishi, N.
2001, Vacuum Society of Japan (44):
[47] Deposition of TiO2 Films by reactive Inductively Coupled Plasma assisted DC magnetron sputtering for high crystallinity and high deposition rate
Han, Y. H.
Jung, S. J.
Lee, J. J.
SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11): : 5387 - 5391
[48] The influence of the Ti intermediate layer on TiN coated on an iron substrate by plasma-enhanced magnetron sputtering ion plating
Wang, YK
Li, XY
Zhang, XL
Han, HM
SURFACE & COATINGS TECHNOLOGY, 1996, 81 (2-3): : 159 - 163
[49] Ion fraction and energy distribution of Ti flux incident to substrate surface in RF-plasma enhanced magnetron sputtering
Fukushima, K
Kusano, E
Kikuchi, N
Saito, T
Saiki, S
Nanto, H
Kinbara, A
VACUUM, 2000, 59 (2-3) : 586 - 593
[50] Ferromagnetic Enhanced Inductively Coupled Plasma Cathode for Thruster Ion Neutralization
Celik, Murat
Kurt, Huseyin
PROCEEDINGS OF THE 17TH INTERNATIONAL CONFERENCE ON ION SOURCES, 2018, 2011

← 1 2 3 4 5 →