Ultrabroadband density of states of amorphous In-Ga-Zn-O

被引:15
|
作者
Vogt, Kyle T. [1 ]
Malmberg, Christopher E. [2 ]
Buchanan, Jacob C. [2 ]
Mattson, George W. [1 ]
Brandt, G. Mirek [1 ]
Fast, Dylan B. [2 ]
Cheong, Paul H-Y [2 ]
Wager, John F. [3 ]
Graham, Matt W. [1 ]
机构
[1] Oregon State Univ, Dept Phys, Corvallis, OR 97331 USA
[2] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA
[3] Oregon State Univ, Sch EECS, Corvallis, OR 97331 USA
来源
PHYSICAL REVIEW RESEARCH | 2020年 / 2卷 / 03期
关键词
THIN-FILM-TRANSISTOR; TOTAL-ENERGY CALCULATIONS; ELECTRONIC-STRUCTURE; NEGATIVE-BIAS; EXTRACTION; MOBILITY; ORIGINS; VOLTAGE;
D O I
10.1103/PhysRevResearch.2.033358
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The subgap density of states of amorphous indium gallium zinc oxide (a-IGZO) is obtained using the ultrabroadband photoconduction response of thin-film transistors (TFTs). Density-functional theory simulations classify the origin of the measured subgap density of states peaks as a series of donorlike oxygen vacancy states and acceptorlike Zn vacancy states. Donor peaks are found both near the conduction band and deep in the subgap, with peak densities of 10(17)-10(18) cm(-3) eV(-1). Two deep acceptorlike peaks lie adjacent to the valance-band Urbach tail region at 2.0-2.5 eV below the conduction-band edge, with peak densities in the range of 10(18) cm(-3) eV(-1). By applying detailed charge balance, we show that increasing the deep acceptor density strongly shifts the a-IGZO TFT threshold voltage to more positive values. Photoionization (h nu > 2.0 eV) of deep acceptors is one cause of transfer curve hysteresis in a-IGZO TFTs, owing to longer recombination lifetimes as electrons are captured into acceptorlike vacancies.
引用
收藏
页数:12
相关论文
共 50 条
  • [41] Physical Properties of Amorphous In-Ga-Zn-O Films Deposited at Different Sputtering Pressures
    Yasuno, Satoshi
    Kita, Takashi
    Hino, Aya
    Morita, Shinya
    Hayashi, Kazushi
    Kugimiya, Toshihiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (03)
  • [42] The Vacancy Pool Model for Amorphous In-Ga-Zn-O Thin-Film Transistors
    Tai, Ya-Hsiang
    Liu, Han-Wen
    Chan, Po-Chun
    IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2019, 7 (01) : 33 - 37
  • [43] Gate-Drain-Bias Stress Study of Amorphous In-Ga-Zn-O TFTs
    Wu, Chen-Yi
    Kao, Yih-Chyun
    Huang, Chun-Yao
    Lin, Chun-Nan
    Chen, Chien Hung
    IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2010, : 793 - 794
  • [44] Operating Temperature Trends in Amorphous In-Ga-Zn-O Thin-Film Transistors
    Hoshino, Ken
    Wager, John F.
    IEEE ELECTRON DEVICE LETTERS, 2010, 31 (08) : 818 - 820
  • [45] Instability in an amorphous In-Ga-Zn-O field effect transistor upon water exposure
    Sharma, Bhupendra K.
    Ahn, Jong-Hyun
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (05)
  • [46] Amorphous In-Ga-Zn-O thin-film transistor with coplanar homojunction structure
    Sato, Ayumu
    Shimada, Mikio
    Abe, Katsumi
    Hayashi, Ryo
    Kumomi, Hideya
    Nomura, Kenji
    Kamiya, Toshio
    Hirano, Masahiro
    Hosono, Hideo
    THIN SOLID FILMS, 2009, 518 (04) : 1309 - 1313
  • [47] Relationship between non-localized tail states and carrier transport in amorphous oxide semiconductor, In-Ga-Zn-O
    Nomura, K.
    Kamiya, T.
    Ohta, H.
    Shimizu, K.
    Hirano, M.
    Hosono, H.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (08): : 1910 - 1914
  • [48] Role of Oxygen in Amorphous In-Ga-Zn-O Thin Film Transistor for Ambient Stability
    Fuh, Chur-Shyang
    Liu, Po-Tsun
    Chou, Yi-Teh
    Teng, Li-Feng
    Sze, S. M.
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2013, 2 (01) : Q1 - Q5
  • [49] Amorphous In-Ga-Zn-O thin-film transistors fabricated by microcontact printing
    Du, Xiaosong
    Frederick, Ryan T.
    Li, Yajuan
    Zhou, Zheng
    Stickle, William F.
    Herman, Gregory S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2015, 33 (05):
  • [50] Review of Present Reliability Challenges in Amorphous In-Ga-Zn-O Thin Film Transistors
    Hsieh, Tien-Yu
    Chang, Ting-Chang
    Chen, Te-Chih
    Tsai, Ming-Yen
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2014, 3 (09) : Q3058 - Q3070