Ultrabroadband density of states of amorphous In-Ga-Zn-O

被引:15
|
作者
Vogt, Kyle T. [1 ]
Malmberg, Christopher E. [2 ]
Buchanan, Jacob C. [2 ]
Mattson, George W. [1 ]
Brandt, G. Mirek [1 ]
Fast, Dylan B. [2 ]
Cheong, Paul H-Y [2 ]
Wager, John F. [3 ]
Graham, Matt W. [1 ]
机构
[1] Oregon State Univ, Dept Phys, Corvallis, OR 97331 USA
[2] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA
[3] Oregon State Univ, Sch EECS, Corvallis, OR 97331 USA
来源
PHYSICAL REVIEW RESEARCH | 2020年 / 2卷 / 03期
关键词
THIN-FILM-TRANSISTOR; TOTAL-ENERGY CALCULATIONS; ELECTRONIC-STRUCTURE; NEGATIVE-BIAS; EXTRACTION; MOBILITY; ORIGINS; VOLTAGE;
D O I
10.1103/PhysRevResearch.2.033358
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The subgap density of states of amorphous indium gallium zinc oxide (a-IGZO) is obtained using the ultrabroadband photoconduction response of thin-film transistors (TFTs). Density-functional theory simulations classify the origin of the measured subgap density of states peaks as a series of donorlike oxygen vacancy states and acceptorlike Zn vacancy states. Donor peaks are found both near the conduction band and deep in the subgap, with peak densities of 10(17)-10(18) cm(-3) eV(-1). Two deep acceptorlike peaks lie adjacent to the valance-band Urbach tail region at 2.0-2.5 eV below the conduction-band edge, with peak densities in the range of 10(18) cm(-3) eV(-1). By applying detailed charge balance, we show that increasing the deep acceptor density strongly shifts the a-IGZO TFT threshold voltage to more positive values. Photoionization (h nu > 2.0 eV) of deep acceptors is one cause of transfer curve hysteresis in a-IGZO TFTs, owing to longer recombination lifetimes as electrons are captured into acceptorlike vacancies.
引用
收藏
页数:12
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