Solution of emulsifiable oil and hydrogen peroxide for chemical-mechanical polishing of Ti alloy-A green approach
被引:17
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作者:
Kaushik, Roopesh M.
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机构:
Def Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, IndiaDef Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, India
Kaushik, Roopesh M.
[1
]
Bhandakkar, Ajit B.
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机构:
Hindustan Aeronaut Ltd, Directorate Gen Aeronaut Qual Assurance, Ojhar 422207, Maharashtra, IndiaDef Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, India
Bhandakkar, Ajit B.
[2
]
Patro, T. Umasankar
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Def Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, IndiaDef Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, India
Patro, T. Umasankar
[1
]
机构:
[1] Def Inst Adv Technol, Dept Mat Engn, Pune 411025, Maharashtra, India
[2] Hindustan Aeronaut Ltd, Directorate Gen Aeronaut Qual Assurance, Ojhar 422207, Maharashtra, India
Metals and alloys;
Surfaces;
Mirror-finish;
Polishing solution;
Chemical-mechanical polishing;
TITANIUM;
D O I:
10.1016/j.matlet.2014.02.059
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
A simple solution mixture comprising an emulsifiable oil and hydrogen peroxide was used for chemical-mechanical polishing (CMP) of Ti alloy with a composition of Ti-6.3Al-1.9V-2.9Zr-2.1 Mo. The solution was found to be an effective polishing agent resulting in mirror-finish of the alloy surface with a considerable reduction in average surface roughness (from Ra similar to 0.1 to 0.04 mu m) within 10 min of CMP. Further the root-mean-square roughness and arithmetic mean deviation of roughness of polished surface were found to be 1.12 nm and 0.96 nm, respectively. The chemical mixture used in the present study is greener and safer compared to the previously used chemicals for polishing of Ti alloys. Further the solution is devoid of any abrasive particles. On account of these advantages, the new polishing solution is expected to find use in mirror-polishing of Ti alloys for aerospace and biomedical applications. (C) 2014 Elsevier B.V. All rights reserved.
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Li, Chenghsing
Cai, Daolin
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Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Cai, Daolin
Liu, Weili
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机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Liu, Weili
Fang, Wencheng
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h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Fang, Wencheng
Cui, Zijing
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机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Cui, Zijing
Song, Zhitang
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h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China