Buckling of Si and Ge(111)2x1 surfaces

被引:13
|
作者
Nie, S [1 ]
Feenstra, RM
Lee, JY
Kang, MH
机构
[1] Carnegie Mellon Univ, Dept Phys, Pittsburgh, PA 15213 USA
[2] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea
来源
关键词
D O I
10.1116/1.1705647
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Voltage-dependent scanning tunneling microscopy is used to determine the buckling of pi-bonded chains on Si and Ge(111)2 x 1 surfaces. Images are acquired over a wide range of voltages, and are compared with theoretical constant-density contours generated from first-principles electronic-structure calculations. The theoretical predictions for <2 (1) over bar(1) over bar > corrugation shifts are quite different for positive and negative buckling; experimental results for Si are found to agree with the former and those for Ge agree with the latter. In addition to an expected shift in <2 (1) over bar(1) over bar > corrugation between small-magnitude positive and negative voltages, a further shift is also seen in both experiment and theory between small and large positive voltages. (C) 2004 American Vacuum Society.
引用
收藏
页码:1671 / 1674
页数:4
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