A new broad-beam alkali ion source for use in ultra high vacuum

被引：3

作者：

Terzic, I ^{[1
]}

Tosic, MM ^{[1
]}

Elazar, J ^{[1
]}

机构：

[1] UNIV BELGRADE, FAC ELECT ENGN, YU-11000 BELGRADE, YUGOSLAVIA

来源：

MEASUREMENT SCIENCE AND TECHNOLOGY | 1996年 / 7卷 / 06期

关键词：

D O I：

10.1088/0957-0233/7/6/014

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new broad-beam ion source of alkali (K+) ions for use in ultra high vacuum was designed, built and tested. The basic principles used have advantages over gas-fed broad-beam ion sources, because there is no need for differential pumping, and because an intrinsically pure ion beam obviates the necessity for charge-to-mass analysis. The source is based on the effect of thermionic emission of K+ ions from solid potassium aluminosilicate (K2O . Al2O3 . 2SiO(2)) emitter. An ion beam current of 0.4 mA has been achieved at an extraction voltage of 3.5 kV with 1.5 cm beam diameter. The degassed broad-beam ion source in operation does not appreciably influence the background pressure in the ultra high vacuum system.

引用

页码：944 / 948

页数：5

共 50 条

[21] Electron beam extraction from a broad-beam vacuum-arc metal plasma source
Russian Acad of Sciences, Tomsk, Russia
IEEE Trans Plasma Sci, 5 (1562-1565):
[22] MATERIAL PROCESSING WITH BROAD-BEAM ION SOURCES
HARPER, JME
CUOMO, JJ
KAUFMAN, HR
ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 413 - 439
[23] DEVELOPMENT OF BROAD-BEAM ION SOURCES AT CSSAR
FENG, YC
YOU, DW
KUANG, YZ
REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (04): : 1304 - 1306
[24] High current-density broad-beam boron ion implantation
Colorado State Univ, Fort Collins, United States
Surf Coat Technol, 1 (52-57):
[25] High current-density broad-beam boron ion implantation
Wilbur, PJ
Davis, JA
Williamson, DL
Vajo, JJ
Wei, R
SURFACE & COATINGS TECHNOLOGY, 1997, 96 (01): : 52 - 57
[26] Simulation of gridded broad-beam ion sources for ultra-precise surface processing
Jankuhn, St.
Scholze, F.
Hartmann, E.
Neumann, H.
REVIEW OF SCIENTIFIC INSTRUMENTS, 2006, 77 (03):
[27] Ion-assist applications of broad-beam ion sources
Kaufman, HR
Harper, JME
ADVANCES IN THIN FILM COATINGS FOR OPTICAL APPLICATIONS, 2004, 5527 : 50 - 68
[28] ETCH CHARACTERIZATION OF A BROAD-BEAM ELECTRON-CYCLOTRON RESONANCE ION-SOURCE
GHANBARI, E
NGUYEN, T
BUI, S
OSTAN, E
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2945 - 2949
[29] SELF-ALIGNED BROAD-BEAM ION OPTICS
LOSSY, R
ENGEMANN, J
UNAL, N
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1992, 39 (02) : 444 - 447
[30] High energy metal ion implantation using a novel, broad-beam, Marx-generator-based ion source ''Magis''
Anders, A
Brown, IG
Dickinson, MR
MacGill, RA
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 127 : 992 - 995

← 1 2 3 4 5 →