Influence of electron and proton irradiation on the electronic properties of microcrystalline silicon

被引:3
|
作者
Brüggemann, R
Kleider, JP
Bronner, W
Zrinscak, I
机构
[1] Carl von Ossietzky Univ Oldenburg, Fachbereich Phys, D-26111 Oldenburg, Germany
[2] Univ Paris 06, Ecole Super Elect, CNRS UMR 8507, Lab Genie Elect Paris, D-26111 Oldenburg, Germany
[3] Univ Paris 11, D-26111 Oldenburg, Germany
[4] Univ Stuttgart, Inst Phys 2, D-70569 Stuttgart, Germany
[5] Univ Abertay Dundee, Sch Sci & Engn, Dundee DD1 1HG, Scotland
关键词
D O I
10.1016/S0022-3093(01)00971-1
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report and detail changes in the electronic properties of microcrystalline silicon (muc-Si) films after 1-MeV electron and 100-MeV proton irradiation. We studied these irradiation effects on undoped muc-Si samples from plasma-enhanced chemical vapour deposition (PECVD) and hot-wire chemical vapour deposition (HWCVD). The samples under investigation also cover a doping series of HWCVD muc-Si samples with a room-temperature dark conductivity range between 10(-7) S/cm and a few S/cm for both n-type and p-type doping in the as-deposited state. Experimental methods applied before and after irradiation include dark conductivity, photoconductivity for the majority carriers and steady-state photocarrier grating for the minority carriers. Application of modulated photocurrent and constant photocurrent methods provide information on changes in the density of states. Annealing effects on the electronic properties are reported for sample storage at room temperature. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:632 / 636
页数:5
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