Threshold Fluence Measurement for Laser Liftoff of InP Thin Films by Selective Absorption

被引:2
|
作者
Jan, Antony [1 ]
Reeves, Benjamin A. [1 ]
de Burgt, Yoeri van [1 ]
Hayes, Garrett J. [1 ]
Clemens, Bruce M. [1 ]
机构
[1] Stanford Univ, Geballe Lab Adv Mat, Dept Mat Sci, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
III-V; InP; laser liftoff; semiconductor; thin film; COMPOUND SEMICONDUCTORS; SOLAR-CELL; GAAS; TECHNOLOGY; DEPENDENCE;
D O I
10.1002/adem.201700624
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We explore conditions for achieving laser liftoff in epitaxially grown heterojunctions, in which single crystal thin films can be separated from their growth substrates using a selectively absorbing buried intermediate layer. Because this highly non-linear process is subject to a variety of process instabilities, it is essential to accurately characterize the parameters resulting in liftoff. Here, we present an InP/InGaAs/InP heterojunction as a model system for such characterization. We show separation of InP thin films from single crystal InP growth substrates, wherein a approximate to 10 ns, Nd: YAG laser pulse selectively heats a coherently strained, buried InGaAs layer. We develop a technique to measure liftoff threshold fluences within an inhomogeneous laser spatial profile, and apply this technique to determine threshold fluences of the order 0.5 J cm(-2) for our specimens. We find that the fluence at the InGaAs layer is limited by non-linear absorption and InP surface damage at high powers, and measure the energy transmission in an InP substrate from 0 to 8 J cm(-2). Characterization of the ejected thin films shows crack-free, single crystal InP. Finally, we present evidence that the hot InGaAs initiates a liquid phase front that travels into the InP substrate during liftoff.
引用
收藏
页数:7
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