A novel photosensitive polyimide: a polyimide containing the hydroxytriphenylamine structure with diazonaphthoquinone

被引:10
|
作者
Akimoto, S
Jikei, M
Kakimoto, M
机构
[1] Toppan Printing Co Ltd, Tech Res Inst, Mat Res Lab, Sugito, Saitama 3458508, Japan
[2] Tokyo Inst Technol, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528552, Japan
关键词
D O I
10.1088/0954-0083/12/1/314
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
A novel photosensitive polyimide based on a polyimide containing the hydroxytriphenylamine structure (HTA-PI) and 2,3,4-tris[1-oxo-2-diazonaphthoquinone-4-sulfonyloxy] benzophenone (D4SB) as a photoreactive compound has been developed. The HTA-PI was prepared by the ring-opening polyaddition of 4,4'-hexafluoroisopropylidenebis(phthalic anhydride) (6FDA) and 4,4'-diamino-4 "-hydroxytriphenylamine (DHTA), followed by thermal cyclization in refluxing N-methyl-2-pyrrolidone (NMP). The resulting polyimide film showed excellent transparency to 436 nm light. Photosensitive polyimide containing 30 wt% of D4SB showed a sensitivity of 800 mJ cm(-2) and a contrast of 0.8 when it was exposed to 436 nm light followed by development with 5% tetramethylammonium hydroxide (TMAH) aqueous solution at 45 degrees C.
引用
收藏
页码:177 / 184
页数:8
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